Method for depositing nanolaminate thin films on sensitive...

Coating processes – Coating by vapor – gas – or smoke – Metal coating

Reexamination Certificate

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C427S252000, C427S255150, C427S255230, C427S255260, C427S255280, C427S255390, C427S255700

Reexamination Certificate

active

06902763

ABSTRACT:
The present method provides tools for growing conformal metal nitride, metal carbide and metal thin films, and nanolaminate structures incorporating these films, from aggressive chemicals. The amount of corrosive chemical compounds, such as hydrogen halides, is reduced during the deposition of transition metal, transition metal carbide and transition metal nitride thin films on various surfaces, such as metals and oxides. Getter compounds protect surface sensitive to hydrogen halides and ammonium halides, such as aluminum, copper, silicon oxide and the layers being deposited, against corrosion. Nanolaminate structures (20) incorporating metal nitrides, such as titanium nitride (30) and tungsten nitride (40), and metal carbides, and methods for forming the same, are also disclosed.

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