Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1996-02-23
1998-07-07
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427249, 427122, B05D 306, C23C 1626
Patent
active
057765537
ABSTRACT:
A method is disclosed for depositing diamond film, including the following steps: providing an environment comprising hydrogen gas and a hydrocarbon gas; dissociating hydrogen gas of the environment by dielectric barrier discharge to obtain atomic hydrogen; and providing a deposition surface in the environment and implementing diamond deposition on the deposition surface from the hydrocarbon gas, assisted by the atomic hydrogen. In a preferred embodiment, the atomic hydrogen is transported by molecular diffusion from its dissociation site to the deposition surface.
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Heuser Michael S.
Jaffe Stephen M.
Shepard Cecil B.
Simpson Matthew
King Roy V.
Novack Martin M.
Saint Gobain/Norton Industrial Ceramics Corp.
Ulbrich Volker R.
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