Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1990-02-12
1992-03-24
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, C23C 1440
Patent
active
050985400
ABSTRACT:
A coating comprised of a continuous film of about 1 to 10 microns of condensed high energy atoms of chromium is found to remain adherent on titanium substrates during repeated thermal recycling while providing substantial oxidation protection up to about 909.degree. C. A film of a ductile chromium alloy that forms a continuous chromium oxide scale can be used instead of the chromium film. The film is deposited by physical vapor deposition processes depositing atoms having a high kinetic energy.
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Davis Jr. James C.
General Electric Company
Magee Jr. James
McGinness James E.
Nguyen Nam X.
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