Method for depositing a titanium film

Details Method for depositing a titanium film Method for depositing a titanium film

1998-05-04

1999-08-24

Meeks, Timothy

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427237, 427239, 427253, 4272557, 438680, C23C 1606

Patent

active

059422823

ABSTRACT:
A first pre-coating film forming gas containing titanium is supplied into a process chamber in which a susceptor for supporting a wafer is located, at the same time heating the susceptor to thereby form, on the susceptor, a first pre-coating film containing titanium as a main component, and then a second pre-coating film forming gas containing titanium and nitrogen is supplied into the process chamber to thereby form, on the pre-coating first film, a second pre-coating film containing titanium nitride as a main component. The wafer is mounted on a part of the second pre-coating film susceptor. A first film forming gas containing titanium is supplied into the process chamber, at the same time heating the susceptor to thereby form, on the wafer, a first film containing titanium as a main component, and then a second film forming gas containing titanium and nitrogen is supplied into the process chamber to thereby form, on the first film on the wafer, a second film containing titanium nitride as a main component.

REFERENCES:
patent: 4923715 (1990-05-01), Matsuda et al.
patent: 5482749 (1996-01-01), Telford et al.

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