Method for depositing a substance with temperature control

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427577, 4272555, B05D 306, C23C 1600

Patent

active

056837593

ABSTRACT:
A method for depositing a substance, such as diamond, by plasma deposition on a substrate mounted over a madrel cooled by a heat exchange, comprising the steps of: determining the heat flux at the deposition surface of the substrate; providing, between said mandrel and said substrate, a spacer having a thermal conductance in its thickness direction that varies in accordance with said determined heat flux; and depositing said substance on said substrate by said plasma deposition.

REFERENCES:
patent: 3845739 (1974-11-01), Erhart et al.
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4471003 (1984-09-01), Cann
patent: 4487162 (1984-12-01), Cann
patent: 4505947 (1985-03-01), Vukanovic et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4585668 (1986-04-01), Asmussen et al.
patent: 4596718 (1986-06-01), Gruner
patent: 4630566 (1986-12-01), Asmussen et al.
patent: 4691662 (1987-09-01), Roppel et al.
patent: 4728863 (1988-03-01), Wertheimer
patent: 4913090 (1990-04-01), Harada et al.
patent: 4987002 (1991-01-01), Sakamoto et al.
patent: 5063031 (1991-11-01), Sato
patent: 5068871 (1991-11-01), Uchida et al.
patent: 5094878 (1992-03-01), Yamamoto et al.
patent: 5104634 (1992-04-01), Calcote
patent: 5108779 (1992-04-01), Gasworth
patent: 5132105 (1992-07-01), Remo
patent: 5204144 (1993-04-01), Cann et al.
patent: 5204145 (1993-04-01), Gasworth
patent: 5226383 (1993-07-01), Bhat
patent: 5318801 (1994-06-01), Snail et al.
patent: 5342660 (1994-08-01), Cann et al.
patent: 5382293 (1995-01-01), Kawarada et al.
patent: 5486380 (1996-01-01), Enniss et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for depositing a substance with temperature control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for depositing a substance with temperature control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for depositing a substance with temperature control will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1831485

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.