Method for depositing a polyimide film

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430311, 430935, 427 58, 438909, G03C 1492, B05D 512

Patent

active

058692193

ABSTRACT:
The present invention discloses a method for coating a polyimide precursor on an electronic structure incorporating the use of a silicon coupling agent without any bubble defect in the film deposited. The method can be carried out by flowing at least one inert gas through a deposition chamber and thereby keeping the relative humidity in the chamber at below 25% to carry away the formation of any water molecules and water vapor to prevent the formation of bubbles in the film deposited.

REFERENCES:
patent: 5180691 (1993-01-01), Adachi et al.
patent: 5270079 (1993-12-01), Bok

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for depositing a polyimide film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for depositing a polyimide film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for depositing a polyimide film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1947435

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.