Method for depositing a film

Details Method for depositing a film Method for depositing a film

1993-02-22

1994-04-19

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427249, 4272552, 4272553, 4272555, 4272556, 427571, 427577, 427578, 427579, 427598, B05D 306

Patent

active

053044070

ABSTRACT:
An apparatus for depositing a film at atmospheric pressure and a method used for this formation are offered. Radicals are produced inside a space in which an electric discharge is induced. This space is shrouded in a purge gas to isolate the space from the outside air, for preventing the radicals traveling to the surface of a substrate from being affected by the outside air. A magnetic field and a bias voltage are made to act on the produced plasma, so that the radicals can reach the substrate surface with greater ease. The arriving radicals promote the formation of the film on the surface of the substrate.

REFERENCES:
patent: 5053243 (1991-10-01), Schuurmans et al.
patent: 5126164 (1992-06-01), Okazaki et al.

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