Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Metallic housing or support
Reexamination Certificate
2007-09-15
2010-11-16
Maldonado, Julio J (Department: 2823)
Semiconductor device manufacturing: process
Packaging or treatment of packaged semiconductor
Metallic housing or support
C438S121000, C438S118000, C257S706000, C257S720000, C257SE23104, C257SE23106
Reexamination Certificate
active
07833839
ABSTRACT:
Various methods and apparatus for establishing a thermal pathway for a semiconductor device are disclosed. In one aspect, a method of manufacturing is provided that includes placing a gel-type thermal interface material in a preselected pattern on a semiconductor chip that is coupled to a substrate. The preselected pattern of gel-type thermal interface material is allowed to partially set up. Additional thermal interface material is placed on the semiconductor chip and cured.
REFERENCES:
patent: 4564562 (1986-01-01), Wong
patent: 5672548 (1997-09-01), Culnane et al.
patent: 6617683 (2003-09-01), Lebonheaur et al.
patent: 6650019 (2003-11-01), Glenn et al.
patent: 6706562 (2004-03-01), Mahajan et al.
patent: 7013965 (2006-03-01), Zhong et al.
patent: 7362580 (2008-04-01), Hua et al.
patent: 7405247 (2008-07-01), Sachdev et al.
patent: 7489033 (2009-02-01), Hua et al.
patent: 2007/0151416 (2007-07-01), Cheng et al.
USPTO Office Action mailed May 18, 2009; U.S. Appl. No. 11/846,618.
Kuechenmeister Frank
Master Raj
Touzelbaev Maxat
Ditthavong Mori & Steiner, P.C.
GLOBALFOUNDRIES Inc.
Maldonado Julio J
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