Method for decreasing surface delamination of gel-type...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Metallic housing or support

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S121000, C438S118000, C257S706000, C257S720000, C257SE23104, C257SE23106

Reexamination Certificate

active

07833839

ABSTRACT:
Various methods and apparatus for establishing a thermal pathway for a semiconductor device are disclosed. In one aspect, a method of manufacturing is provided that includes placing a gel-type thermal interface material in a preselected pattern on a semiconductor chip that is coupled to a substrate. The preselected pattern of gel-type thermal interface material is allowed to partially set up. Additional thermal interface material is placed on the semiconductor chip and cured.

REFERENCES:
patent: 4564562 (1986-01-01), Wong
patent: 5672548 (1997-09-01), Culnane et al.
patent: 6617683 (2003-09-01), Lebonheaur et al.
patent: 6650019 (2003-11-01), Glenn et al.
patent: 6706562 (2004-03-01), Mahajan et al.
patent: 7013965 (2006-03-01), Zhong et al.
patent: 7362580 (2008-04-01), Hua et al.
patent: 7405247 (2008-07-01), Sachdev et al.
patent: 7489033 (2009-02-01), Hua et al.
patent: 2007/0151416 (2007-07-01), Cheng et al.
USPTO Office Action mailed May 18, 2009; U.S. Appl. No. 11/846,618.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for decreasing surface delamination of gel-type... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for decreasing surface delamination of gel-type..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for decreasing surface delamination of gel-type... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4248679

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.