Method for decontamination of a chamber used in vacuum processes

Details Method for decontamination of a chamber used in vacuum processes Method for decontamination of a chamber used in vacuum processes

1987-12-02

1990-01-09

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

118715, 118 50, 156345, 204298, B44C 122, B05D 306, C23C 1400

Patent

active

048926159

ABSTRACT:
A decontamination system for processes for deposition, etching and/or growth of high purity films, particularly applicable to semiconductor technology.
After introducing the products concerned with a process into a chamber and after creating a vacuum in the chamber, the chamber is decontaminated by a series of intermittent inflows of non-contaminating gas and subsequent pressure varying operations.

REFERENCES:
patent: 3170859 (1965-02-01), Boudart et al.
patent: 4421576 (1983-12-01), Jolly
patent: 4687542 (1987-08-01), Davis et al.
Journal of the Electrochemical Society, vol. 132, No. 3, Mar. 1985, pp. 642-648.
Patent Abstracts of Japan, vol. 10, No. 283, Sep. 26, 1986.
Patent Abstracts of Japan, vol. 7, No. 123, May 27, 1983.

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