Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2007-01-09
2007-01-09
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
Work support
C118S500000, C156S345230
Reexamination Certificate
active
10688384
ABSTRACT:
A substrate support assembly and method for dechucking a substrate is provided. In one embodiment, a support assembly includes a substrate support having a support surface, a first set of lift pins and one or more other lift pins movably disposed through the substrate support. The first set of lift pins and the one or more lift pins project from the support surface when the pins are in an actuated position. When in the actuated position, the first set of lift pins project a longer distance from the support surface than the one or more other lift pins. In another aspect of the invention, a method for dechucking a substrate from a substrate support is provided. In one embodiment, the method includes the steps of projecting a first set of lift pins a first distance above a surface of a substrate support, and projecting a second set of lift pins a second distance above the surface of the substrate support that is less than the first distance.
REFERENCES:
patent: 4556362 (1985-12-01), Bahnck et al.
patent: 4944650 (1990-07-01), Matsumoto
patent: 5098501 (1992-03-01), Nishiguchi
patent: 5352294 (1994-10-01), White et al.
patent: 5380566 (1995-01-01), Robertson et al.
patent: 5518593 (1996-05-01), Hosokawa et al.
patent: 5582866 (1996-12-01), White
patent: 5677824 (1997-10-01), Harashima et al.
patent: 5788778 (1998-08-01), Shang et al.
patent: 5823736 (1998-10-01), Matsumura
patent: 5983906 (1999-11-01), Zhao et al.
patent: 5997651 (1999-12-01), Matsuse et al.
patent: 6002840 (1999-12-01), Hofeister
patent: 6109677 (2000-08-01), Anthony
patent: 6140256 (2000-10-01), Ushikawa
patent: 6183189 (2001-02-01), Lzu et al.
patent: 6305677 (2001-10-01), Lenz
patent: 6676761 (2004-01-01), Shang et al.
patent: 6887317 (2005-05-01), Or et al.
patent: 0 798 775 (1997-10-01), None
patent: 2000-294482 (2000-10-01), None
patent: WO 97/20340 (1997-06-01), None
The definitions of “project” and “acutate” according to answers.com.
English Translation of JP 2000-294482.
Greene Robert L.
Harshbarger William R.
Shang Quanyuan
Shimizu Ichiro
Applied Materials Inc.
Hassanzadeh Parviz
MacArthur Sylvia R.
Patterson & Sheridan LLP
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