Method for correcting deflection distortion in an apparatus for

Details Method for correcting deflection distortion in an apparatus for Method for correcting deflection distortion in an apparatus for

1981-01-23

1983-08-02

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

315370, 356357, 356371, 356373, 364563, 364571, 382 61, 382 66, H01J 2970, G06K 710

Patent

active

043969011

ABSTRACT:
In a method for correcting deflection distortion which develops in an apparatus for delineating a pattern on a sample by scanning a charged particle beam thereover, the corrections of the deflection distortions are made in accordance with the height (deformation) of a portion-to-be-delineated on a sample (for example, a wafer) on the basis of correction magnitudes of the deflection distortions at respective reference levels of a mark as obtained by scanning the charged particle beam on the mark which has at least two reference levels having unequal heights in the direction of an optical axis.

REFERENCES:
patent: 3743883 (1973-07-01), Burns
patent: 3861804 (1975-01-01), Lehmbeck
patent: 4053234 (1977-10-01), McFarlane
patent: 4099092 (1978-07-01), Bristow
patent: 4160935 (1979-07-01), Groot et al.
patent: 4203051 (1980-05-01), Hallett et al.
patent: 4291990 (1981-09-01), Takasu
patent: 4332477 (1982-06-01), Sato
patent: 4355900 (1982-10-01), Nussmeier
patent: 4358201 (1982-11-01), Makosch
Jones et al., "Design Aspects of a Scanning Electron-Beam-Microfabrication Instrument . . . ," J. Vac. Sci. Technol., vol. 15, No. 3, May/Jun. 1978, pp. 896-900.
Asai et al., "Distortion Correction and Deflection Calibration . . . ," J. Vac. Sci. Technol., vol. 16, No. 6, Nov./Dec. 1979, pp. 1710-1714.

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