Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1998-01-09
2000-07-04
Gulakowski, Randy
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 19, 134 221, 438905, B08B 500, B08B 900
Patent
active
060833238
ABSTRACT:
An apparatus and a concomitant method for controlling coolant (air) flow proximate a reaction chamber within a workpiece processing system such that the temperature of a wall of the reaction chamber is maintained at a predefined target temperature. The target temperature is typically a temperature that optimizes a process concurrently being accomplished within the chamber, e.g., utilizing one temperature during deposition processes and a different temperature during cleaning processes. The apparatus contains a temperature measuring device to measure the temperature of the chamber wall. The measured temperature is compared to the predefined target temperature. A closed loop system controls the air flow proximate the chamber walls such that the measured temperature becomes substantially equal to the target temperature. Air flow control is provided by an air flow control device located within an inlet conduit that supplies air to a shroud for channeling the air past the reaction chamber. The shroud forms a portion of a housing which supports and encloses the reaction chamber.
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Anderson Roger N.
Carlson David K.
Riley Norma
Applied Materials Inc.
Chaudhry Saeed
Gulakowski Randy
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