Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-01-18
2011-01-18
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C134S001000
Reexamination Certificate
active
07871742
ABSTRACT:
A method for controlling phase angle of a mask is provided. A mask comprising a substrate and an absorber is formed. A nitrogen-containing plasma treatment is performed on the mask to reduce the phase angle. Alternatively, a nitrogen-containing plasma treatment is performed on the mask, followed by a vacuum ultraviolet treatment to form a passivated layer on the mask.
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patent: 2005/0208393 (2005-09-01), Dieu et al.
patent: 2006/0019178 (2006-01-01), Lee et al.
patent: 2006/0166108 (2006-07-01), Chandrachood et al.
patent: 2007/0012335 (2007-01-01), Chang et al.
Chen Chun-Lang
Huang Chien-Chao
Shen Tran-Hui
Tsai Fei-Gwo
Fraser Stewart A
Haynes and Boone LLP
Huff Mark F
Taiwan Semiconductor Manufacturing Company , Ltd.
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