Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-07-26
2005-07-26
McPherson, John A. (Department: 1756)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192230, C204S192150, C204S192160, C204S192270, C204S192120, C204S298130, C264S123000, C264S125000, C427S249150
Reexamination Certificate
active
06921465
ABSTRACT:
A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously or intermittently to deposit and form, on a substrate, a thin film having different refractive indices along its thickness. A method for making a sputter built-up film is also described, which comprising providing silicon carbide as a target and subjecting to sputtering while changing making electric power against the target continuously or intermittently to deposit and form a thin film having different refractive indices along its thickness.
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Misaki H. et al., “Hydrogen-Containing Sicn Protective Films For Magneto-Optical Media”, vol. 25, NR. 5, pags 4030-4032, XP000069274.
Lu W-J et al., “Thermal Oxidation of Sputtered Silicon Carbide Thin Films”, vol. 131, No. 8, Aug. 1984, pp. 1904-1914, XP000840256.
Kumagai Sho
Ohno Shingo
Yoshikawa Masato
Bridgestone Corporation
Chacko-Davis Daborah
McPherson John A.
Sughrue & Mion, PLLC
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