Method for controlled removal of material from a solid surface

Details Method for controlled removal of material from a solid surface Method for controlled removal of material from a solid surface

1997-10-17

2000-02-08

Utech, Benjamin

Etching a substrate: processes

Gas phase etching of substrate

Etching inorganic substrate

216 76, 216 79, 216 80, 216 81, 216 96, 216 97, 216100, 216101, H01L 21302, B44C 122

Patent

active

060224851

ABSTRACT:
A catalytic method and an apparatus for selectively removing material from a solid substrate is provided. The method comprises contacting a surface of a solid substrate with a catalyst material in the presence of a reactant under conditions effective to selectively remove material from those areas of said solid substrate in contact with said catalyst material and said reactant.

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"Catalyzed Gaseous Etching of Silicon"; J. Appl. Phys. (1987), 62(3), pp. 1049-1053; Selamoglu et al.

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