Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2007-12-11
2007-12-11
Fletcher, III, William Phillip (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C313S113000, C313S114000, C313S635000
Reexamination Certificate
active
10502408
ABSTRACT:
In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOyand SiOxby means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.
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Bewig Lars
Kuepper Thomas
Maring Wolfram
Moehl Wolfgang
Moelle Christopher
Fletcher, III William Phillip
Schott AG
Sellman Cachet
Striker Michael J.
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