Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-11-08
1991-09-10
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C23C 1414
Patent
active
050471317
ABSTRACT:
A method of depositing thin films of silicon based compounds, particularly silicon dioxide, by cathode reactive sputtering utilizes a rotating cylindrical magnetron driven by a d.c. potential. The result is a technique of forming a uniform film on large substrates with high deposition rates. Arcing normally associated with sputtering troublesome dielectric coatings such as silicon oxides is substantially eliminated.
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Boehmler Carolynn
Hofmann James J.
Wolfe Jesse D.
Draegert David A.
Marquis Steven P.
Niebling John F.
Pearlman Robert I.
The BOC Group Inc.
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