Method for coating polymethylmethacrylate substrate with aluminu

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

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20419215, C23C 1434

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active

050749846

ABSTRACT:
In a device for coating a substrate 1 made of polymethylmethacrylate with aluminum by means of a direct current source 10 which is connected to an electrode 5 disposed in an evacuable coating chamber 15a and electrically connected to a target 3 to be sputtered and the sputtered particles are deposited on a substrate 1 and wherein a process gas is introduced into the coating chamber (15, 15a), helium has is introduced as a process gas in order to improve adhesiveness and service life 2.

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The Condensed Chemical Dictionary, 9th Ed., pp. 14 and 466.
Valiev et al., The Kinetics and Mechanism of PMMA Photoetching by UV Radiation, Phys. Chem. Mech. Surfaces, vol. 4(6) (1986) pp. 1776-1794.
Gray, American Institute of Physics Handbook, pp. 7-26 & 7-27.

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