Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-12-13
1991-12-24
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, C23C 1434
Patent
active
050749846
ABSTRACT:
In a device for coating a substrate 1 made of polymethylmethacrylate with aluminum by means of a direct current source 10 which is connected to an electrode 5 disposed in an evacuable coating chamber 15a and electrically connected to a target 3 to be sputtered and the sputtered particles are deposited on a substrate 1 and wherein a process gas is introduced into the coating chamber (15, 15a), helium has is introduced as a process gas in order to improve adhesiveness and service life 2.
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The Condensed Chemical Dictionary, 9th Ed., pp. 14 and 466.
Valiev et al., The Kinetics and Mechanism of PMMA Photoetching by UV Radiation, Phys. Chem. Mech. Surfaces, vol. 4(6) (1986) pp. 1776-1794.
Gray, American Institute of Physics Handbook, pp. 7-26 & 7-27.
Fritsche Wolf-Eckart
Krug Thomas
Pollmann Martin
Sichmann Eggo
Leybold Aktiengesellschaft
Nguyen Nam X.
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