Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-04-29
1995-04-18
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419223, C23C 1434
Patent
active
054075483
ABSTRACT:
The invention concerns a process for coating a substrate 1 of little or no corrosion resistance, especially a metal substrate having an alloy consisting at least of Ni, Cr and Fe, in an evacuable coating chamber 15, 15a. It comprises making an electrode that can be connected to a current supply 10, this electrode being electrically connected to a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1. Reactive process gases are, for this purpose, supplied to the coating chamber 15, 15a, so that an amorphously depositing layer 2 is applied onto the substrate.
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Firmenschrift GfE, Gesellschaft fur Elektrometallurgie mbH, Dusseldorf, "Legierungen Metalle", Ausgabe Mai 1984.
Firmenschrift GfE, "PVD Beschichtungswerkstoffe", erhalten zur Fruhjahrsmesse Leipzig 1989.
Becker Horst
Daube Christoph
Konietzka Uwe
Kopacz Uwe
Rack Andreas
Degussa - Aktiengesellschaft
Leybold Aktiengesellschaft
Nguyen Nam
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