Method for cleaning the surface of a substrate

Details Method for cleaning the surface of a substrate Method for cleaning the surface of a substrate

2006-06-20

2006-06-20

Goudreau, George A. (Department: 1763)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001300, C216S062000, C216S078000, C438S705000, C438S714000, C438S715000, C438S734000

Reexamination Certificate

active

07063091

ABSTRACT:
A cleaning process for cleaning the surface of a substrate is disclosed, wherein the surface comprises portions of a dielectric material and portions of a conductive material. According to the method disclosed, the temperature at the surface of the substrate is kept below a predefined value during the actual cleaning step in a reactive and/or inert plasma ambient, such as an argon gas ambient, wherein the predefined value corresponds to the surface temperature at which agglomeration of the conductive material occurs.

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