Method for cleaning surfaces by ion milling

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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134 1, 134 33, 156639, 156640, 156646, 20492E, 204298, B08B 312, B08B 600, B08B 700, B44C 122

Patent

active

042784930

ABSTRACT:
A method for cleaning uneven substrate surfaces having channels, via holes or stepped surface topography. In accordance with the method, an electron beam device which generates a solid angle source of ions is provided. A substrate having an uneven surface topography is oriented in the path of the solid angle source of ion at a particular angle with reference to the center line of the ion beam source. While in the particular orientation with respect to the center line, the substrate is rotated about an axis normal to the plane of the substrate surface.

REFERENCES:
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patent: 3548189 (1970-12-01), Meinel et al.
patent: 3769109 (1973-10-01), MacRae
patent: 3868271 (1975-02-01), Poley et al.
patent: 4016062 (1977-04-01), Mehta
patent: 4098917 (1978-07-01), Bullock et al.
patent: 4126530 (1978-11-01), Thornton
patent: 4135998 (1979-01-01), Gniewek et al.
patent: 4147573 (1979-04-01), Morimoto
patent: 4148705 (1979-04-01), Battey et al.
J. Vac. Sci. Technol., vol. 13, No. 5, Sep./Oct. 1976, Ion Etching for Pattern Delineation by C. M. Melliar-Smith, pp. 1008-1021.
J. Vac. Sci. Technol., vol. 15, No. 5, Sep./Oct. 1978, Influence of Sample Inclination and Rotation During Ion-Beam Etching on Ion-Etched Structures by Sumio Hosaka et al., pp. 1712-1717.

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