Method for cleaning semiconductor wafers to improve dice to subs

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

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216 79, B08B 700

Patent

active

058337580

ABSTRACT:
A method of plasma cleaning semiconductor wafers for subsequent soldering the dice cut from the semiconductor wafers to a substrate. The plasma cleaning removes all contaminants such that the semiconductor dice has improved solderability.

REFERENCES:
patent: 4797178 (1989-01-01), Bui et al.
patent: 5252181 (1993-10-01), Dutartre
patent: 5451263 (1995-09-01), Linn et al.

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