Optics: measuring and testing – With plural diverse test or art
Reexamination Certificate
2011-03-22
2011-03-22
Evans, F. L (Department: 2877)
Optics: measuring and testing
With plural diverse test or art
C356S316000
Reexamination Certificate
active
07911598
ABSTRACT:
Components (30) in the interior of an EUV lithography device for extreme ultraviolet and soft X-ray wavelength range are cleaned by igniting a plasma, adjacent to the component (30) to be cleaned, using electrodes (29), wherein the electrodes (29) are adapted to the form of the component (30) to be cleaned. The residual gas atmosphere is measured spectroscopically on the basis of the plasma. An emission spectrum is preferably recorded in order to monitor the degree of cleaning. An optical fiber cable (31) with a coupling-in optical unit (32) is advantageously used for this purpose. Moreover, in order to monitor the contamination in the gas phase within the vacuum chambers during the operation of an EUV lithography device, it is proposed to provide modules configured to initiate a gas discharge and to detect radiation emitted on account of the gas discharge. The contamination in the gas phase can be deduced from the analysis of the measured spectrum.
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Ehm Dirk Heinrich
Kraus Dieter
Schmidt Stefan-Wolfgang
Stein Thomas
Woelfle Harald
Carl Zeiss SMT AG
Evans F. L
Sughrue & Mion, PLLC
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