Method for cleaning a CVD chamber

Details Method for cleaning a CVD chamber Method for cleaning a CVD chamber

2006-06-19

2008-12-16

Hassanzadeh, Parviz (Department: 1792)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C118S7230ER, C156S345470

Reexamination Certificate

active

07464717

ABSTRACT:
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

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