Method for chemical vapor deposition of a material on a substrat

Details Method for chemical vapor deposition of a material on a substrat Method for chemical vapor deposition of a material on a substrat

1998-04-14

2000-10-24

Bowers, Charles

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

438584, H01L 2164, H01L 21441

Patent

active

061367257

ABSTRACT:
A method for chemical vapor deposition includes dispensing a precursor to a vaporizer positioned within a vaporization chamber and delivering a vapor to a process chamber without a carrier gas. A flow meter is positioned within the delivery conduit for measuring the flow rate of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.

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