Semiconductor device manufacturing: process – Chemical etching
Reexamination Certificate
2011-01-18
2011-01-18
Olsen, Allan (Department: 1716)
Semiconductor device manufacturing: process
Chemical etching
C438S691000, C438S692000, C438S693000, C216S089000
Reexamination Certificate
active
07871931
ABSTRACT:
The present invention provides a method for planarizing a metal layer, and a method for manufacturing a micro pixel array. The method for planarizing the metal layer, without limitation, may include the steps of forming a metal layer over a photoresist layer, and then planarizing the metal layer using a chemical mechanical planarization process.
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Baker James C.
Chen Jingqiu
DiCarlo Anthony
He Yanghua
Rothenbury David A.
Brady III Wade James
Brill Charles A.
Olsen Allan
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
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