Method for checking periodic structures on lithography masks

Details Method for checking periodic structures on lithography masks Method for checking periodic structures on lithography masks

2004-07-20

2008-09-09

Mehta, Bhavesh (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C356S496000, C977S840000

Reexamination Certificate

active

07424144

ABSTRACT:
The invention, which relates to a method for checking periodic structures on lithography masks, in which an image of the structure of the lithography mask is generated by an imaging optic of a microscope, provides a method for inspecting structures on lithography masks which is used to represent deviations in the periodic structure of a lithography mask, a better demarcation of the periodic structure from a deviation being achieved. The parameters of wavelength λ, the numerical aperture NA and the coherence of the illumination σ of the imaging optic of the microscope are chosen such that the inequalityP≤λNA⁡(1+σ)describing the resolution limit for a periodic structure having the period P is fulfilled, and in that the image of the structure that is generated in this way is evaluated for deviations in the periodic structure.

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