Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1982-03-29
1983-07-12
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430313, 430314, 430260, 156630, 156293, 29 2535, G03C 500
Patent
active
043931316
ABSTRACT:
A method of captivating a substrate within a holder for photolithographic processing is shown. A substrate is placed within the aperture of a holder and is sandwiched into place by laminating it with layers of dry film photopolymer resist. Portions of the photopolymer resist are polymerized. Unpolymerized portions are washed away leaving retaining tabs of polymerized resist which hold the substrate within the holder for an etching or plating process.
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Dworsky Lawrence N.
Scansaroli Michael N.
Shanley Charles W.
Whalin Jeffery A.
Dees Jos,e G.
Gillman James W.
Kittle John E.
Miller Jerry A.
Motorola Inc.
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