Thermal measuring and testing – Thermal calibration system
Patent
1998-12-23
2000-10-17
Bennett, G. Bradley
Thermal measuring and testing
Thermal calibration system
437200, 438655, 374126, 374128, 374178, H01L 2100, G01K 1500, G01J 508
Patent
active
061320811
ABSTRACT:
The present invention provides a method of forming titanium silicide by subjecting a silicon substrate having titanium formed thereon to a thermal process, such as rapid thermal process. The silicon substrate and the titanium are being heated to at least a selected annealing temperature, which is the minimum temperature on and after which the titanium silicide displays generally constant sheet resistivity and resistance non-uniformity. The selected annealing temperature is determined by heating the silicon substrate and the titanium from an initial temperature to a final temperature to create titanium silicide and measuring the sheet resistance and/or resistance non-uniformity at selected temperature intervals between the initial temperature and the final temperature. The temperature on and after which the sheet resistance and resistance non-uniformity is generally constant is the selected annealing temperature. The temperature of the silicon substrate and titanium can be measured by an optical sensor such as an optical pyrometer. The selected annealing temperature can be used to calibrate the optical sensor for more accurate measurement of the temperature during the thermal process.
REFERENCES:
patent: 4468308 (1984-08-01), Scovell et al.
patent: 4698486 (1987-10-01), Sheets
patent: 4886765 (1989-12-01), Chen et al.
patent: 5043300 (1991-08-01), Nulman
patent: 5326173 (1994-07-01), Evans et al.
patent: 5388909 (1995-02-01), Johnson et al.
patent: 5553939 (1996-09-01), Dilhac et al.
patent: 5593923 (1997-01-01), Horiuchi et al.
patent: 5612253 (1997-03-01), Farahani et al.
patent: 5686359 (1997-11-01), Meester et al.
patent: 5707146 (1998-01-01), Gaus et al.
patent: 5731226 (1998-03-01), Lin et al.
patent: 5762713 (1998-06-01), Paranipe
patent: 5828131 (1998-10-01), Cabral, Jr. et al.
patent: 5841110 (1998-11-01), Nenyei et al.
patent: 5848842 (1998-12-01), Peuse et al.
patent: 5883003 (1999-03-01), Matsubara
patent: 5897381 (1999-04-01), Aronowitz et al.
patent: 5937325 (1999-08-01), Ishida
patent: 5938335 (1999-08-01), Yam
patent: 5962872 (1999-10-01), Zhang et al.
patent: 5988874 (1999-11-01), Rohner
patent: 6056433 (2000-05-01), Yam
Amkor Technology Inc.
Anam Semiconductor Inc.
Bennett G. Bradley
Korea Kenneth S.
Parsons James E.
LandOfFree
Method for calibrating optical sensor used to measure the temper does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for calibrating optical sensor used to measure the temper, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for calibrating optical sensor used to measure the temper will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-461853