Method for broad wavelength scatterometry

Details Method for broad wavelength scatterometry Method for broad wavelength scatterometry

1997-03-07

1999-02-02

McGraw, Vincent P.

Optics: measuring and testing

Of light reflection

356355, 356446, G01N 2147, G01B 902

Patent

active

058672761

ABSTRACT:
An optical scatterometer system enables analysis of a sample material at various wavelengths without rotating or otherwise moving the sample material.

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patent: 5703692 (1997-12-01), McNeil et al.
Raymond, Christopher J. et al., "Metrology of subwavelength photoresist gratings using optical scatterometry", Journal of Vacuum Science and Technology B 13(4), Jul./Aug., 1995 (pp. 1484-1495).
Murnane, Michael R. et al., "Developed photoresist metrology using scatterometry", SPIE, vol. 2196 (pp. 47-59). No Date.
Murnane, Michael R. et al., Scatterometry for 0.24 um--0.70 um developed photoresist metrology, SPIE, 1995.
S.S.H. Naqvi et al., "Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles", Journal of the Optical Society of America,vol. II, No. 9, Sep. 1994 (pp. 2485-2493).
Hatab, Ziad R. et al., "Sixteen-megabit dynamic random access memory trench depth characterization using two-dimensional diffraction analysis", Journal of Vacuum Science and Technology,B 13(2), Mar./Apr. 1995 (pp. 174-182).

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