Method for bonding and debonding films using a...

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Subsequent separation into plural bodies

Reexamination Certificate

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C438S459000, C438S977000

Reexamination Certificate

active

06638835

ABSTRACT:

FIELD OF THE INVENTION
An embodiment of the present invention relates generally to integrated circuit fabrication. More particularly, an embodiment of the present invention relates to debonding a thin semiconductor layer and bonding it to a transfer substrate.
BACKGROUND OF THE INVENTION
Description of Related Art
Thin semiconductor layers (sometimes referred to as epitaxial (EPI) wafers) are used to control the detrimental effects of resistance-capacitance (RC) that occur in semiconductor devices. One challenge with thin semiconductor layers is their high cost. To that end, one solution has been to debond a semiconductive layer from its formerly integral substrate and to bond it to another substrate that provides an RC advantage over the prior art. A high-cost, and high yield-loss disadvantage is the processing needed to get a smooth enough surface from the debonded semiconductive layer to allow for efficient bonding to another semiconductive structure.


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patent: 6136171 (2000-10-01), Frazier et al.
patent: 6146979 (2000-11-01), Henley et al.
patent: 6323108 (2001-11-01), Kub et al.
patent: 6413874 (2002-07-01), Sato
patent: 6429104 (2002-08-01), Auberton-Herve
patent: 6486008 (2002-11-01), Lee
patent: 6563133 (2003-05-01), Tong

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