Chemistry of inorganic compounds – Nitrogen or compound thereof – Binary compound
Patent
1992-04-16
1993-08-10
Langel, Wayne
Chemistry of inorganic compounds
Nitrogen or compound thereof
Binary compound
2523131, 501 96, B01J 1300, C01B 21072, C04B 3558
Patent
active
052346765
ABSTRACT:
An aqueous composition containing aluminum nitride powder which exhibits a reduced tendency for hydrolysis of the aluminum nitride contained therein. The aqueous composition comprises (a) a liquid medium containing water, (b) aluminum nitride powder, and (c) a combination of buffering agents which controls the pH of water from about 5.5 to about 7.5, wherein the combination of buffering agents is employed at a lower weight percent concentration than that of the aluminum nitride powder. In another embodiment of the invention, a method of processing aluminum nitride powder in water which exhibits a reduced tendency for hydrolysis of the aluminum nitride is disclosed, which method involves mixing the above-described aqueous composition.
REFERENCES:
patent: 2943928 (1960-07-01), Guth
patent: 3709723 (1973-01-01), Watanabe et al.
patent: 3738863 (1973-06-01), Sugaika et al.
patent: 4923689 (1990-05-01), Uenishi et al.
114:233766; Ito et al, published 1991 (Chemical Abstracts).
114:127438b; Utsugi; published 1990 (Chemical Abstracts).
106:74703k; Avotins et al, published 1986 (Chemical Abstracts).
99:128943w; Cera, et al., published 1983 (Chemical Abstracts).
73:49110g; Pletyushkin et al, published 1970 (Chemical Abstracts).
50:10586i; Flament, published 1954 (Chemical Abstracts).
Langel Wayne
The Dow Chemical Company
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