Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-12-08
1990-07-31
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, C23C 1435
Patent
active
049448587
ABSTRACT:
Sputtering techniques are utilized to form an aluminum rich diffusion coating on the surface of a superalloy substrate. The coating contains additions of oxygen active elements, such as yttrium, and the coating has an outward diffusion aluminide microstructure obtained by carrying the sputtering process out at temperatures in the range of about 1,010.degree.-1,150.degree. C.
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Fenton Richard J.
Hendricks Robert E.
Murphy Kenneth S.
Nguyen Nam X.
Rashid James M.
United Technologies Corporation
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