Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-08-01
1989-11-28
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419217, C23C 1434
Patent
active
048835749
ABSTRACT:
A method is described for applying coatings to objects by means of magnetic ield supported cathode sputtering in a vacuum, wherein, in order to achieve an improved coating rate, the total reactive gas quantity fed into a coating chamber is so measured that the reactive gas portion in the metal-reactive gas compound of the coating on the workpiece, is present in sub-stoichiometric relationship, and wherein the reactive gas flow in the chamber is conducted directly into the area of the workpieces to be coated, by-passing the sputtering cathode.
REFERENCES:
patent: 4384933 (1983-05-01), Takasaki
patent: 4428811 (1984-01-01), Sproul et al.
patent: 4702967 (1987-10-01), Black et al.
A. Mumtaz et al., J. Vac. Sci. Technol., vol. 20, pp. 345-348, (1982).
R. McMahon et al., J. Vac. Sci Technol, vol. 20, pp. 376-378, (1982).
Hartec Gesellschaft fur Hartstoffe und Dunnschichttechnik mbH &
Weisstuch Aaron
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