Method for applying a uniform coating to integrated circuit wafe

Fishing – trapping – and vermin destroying

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427 99, 427124, 4272551, 4272552, 427253, 118728, H01L 2188

Patent

active

046968334

ABSTRACT:
A method and an apparatus are disclosed which are suitable for applying uniform coatings to integrated circuit (IC) wafers by means of chemical vapor deposition in a process suitable for use in mass production of IC wafers. The process introduces a first group of reactant gases into the vicinity of the wafers through at least one inlet. The number of inlets and the positions of inlets are selected to reduce the total variation in thickness produced on a batch of wafers to within preselected values of variations. The choices of pressure and temperature as well as the choice of gases in the first group are selected to optimize uniformity.

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