Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-05-03
2005-05-03
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192100, C427S106000, C427S107000
Reexamination Certificate
active
06887354
ABSTRACT:
A method for applying a coating (23) to a part of a surface of a lamp (20). The aim is to provide a simple manner of applying exact coatings to parts of surfaces with complicated designs. To this end, the lamp is vacuum-coated. The parts of the surface of the lamp (20) that are not to be coated are covered by a mask (3) and at least one coat is applied to the non-covered parts of the surface. The mask (3) is located at a predetermined distance (d) from the part of the surface of the lamp (20) and the mask (3) is oriented in relation to an illumination element (2) or a base (21) of the lamp (20). The invention also relates to a coated lamp that is produced according to a method of this type.
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Database WPI Section EI, Week 200201 Derwent Publications Ltd., London, GB; AN 2002-000107 XP002188755 & CN 1 773 037 A (China Kinescope Co Ltd), Feb. 11, 1998.
“Handbook of Sputter Deposition Technology and Applications” von Kiyotaka Wasa, 1992 bei Noyes Publications, Fairview Ave. Westwood, New Jersey 07675 USA.
Karras Bernd
Krüger Ursus
Pyritz Uwe
Ullrich Raymond
SIEMENS Aktiengesellschaft
Versteeg Steven
Young & Thompson
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