Method for allowing a particle to follow a path

Computer graphics processing and selective visual display system – Computer graphics processing – Animation

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

G06T 1570

Patent

active

060141514

ABSTRACT:
A method, apparatus, and article of manufacture for allowing a particle to follow a path. A one dimensional path having an attraction force which affects particles is embodied in N-dimensional space, such as two dimensional or three dimensional space. The attraction force is then applied to the particle in the direction of the path, where the magnitude of the force corresponds to the distance between the particle and the path. The attraction force may optionally be applied for only a percentage of the path length.

REFERENCES:
patent: 5404426 (1995-04-01), Usami et al.
patent: 5777619 (1998-07-01), Brinsmead
"3D Studio Max Applied", Clayton et al., Advanstar Communications, pp. 114-120, 1996.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for allowing a particle to follow a path does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for allowing a particle to follow a path, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for allowing a particle to follow a path will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1465860

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.