Coating processes – Coating by vapor – gas – or smoke
Patent
1997-07-11
2000-05-16
Meeks, Timothy
Coating processes
Coating by vapor, gas, or smoke
118715, 438689, 438758, C23C 1600
Patent
active
060634405
ABSTRACT:
A method for aligning a wafer on a support member within a vacuum chamber includes increasing the pressure within the vacuum chamber to at least about 1 Torr before aligning the wafer. The wafer is introduced into the vacuum chamber on the support member, the pressure is increased to at least about one Torr, and the support member is lifted into a shadow ring that has a frustoconical inner cavity constructed to funnel the wafer to a centered, aligned position.
REFERENCES:
patent: 5326725 (1994-07-01), Sherstinsky et al.
patent: 5516367 (1996-05-01), Lei et al.
U.S. application No. 08/564,398, Marohl et al., Nov. 29, 1995.
U.S. application No. 08/939,962, Lei et al., Nov. 29, 1997.
Chen Ling
Lei Lawrence C.
Yu Ying
Yudovsky Joseph
Applied Materials Inc.
MacArthur Sylvia R
Meeks Timothy
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