Method for air gap formation using UV-decomposable materials

Details Method for air gap formation using UV-decomposable materials Method for air gap formation using UV-decomposable materials

2007-10-17

2010-11-09

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

C430S270100, C430S331000, C430S905000, C430S311000, C430S322000, C430S927000, C430S945000

Reexamination Certificate

active

07829268

ABSTRACT:
A method of selectively removing a sacrificial material on a substrate is described. The method comprises forming a sacrificial layer on a substrate. Thereafter, the sacrificial layer is selectively decomposed at a temperature less than the temperature required to thermally decompose the sacrificial layer by selectively exposing the sacrificial layer to UV radiation.

REFERENCES:
patent: 7098476 (2006-08-01), Babich et al.
patent: 7256127 (2007-08-01), Gallagher et al.
patent: 7396634 (2008-07-01), Shibuya
patent: 7402373 (2008-07-01), Kim et al.
patent: 7666754 (2010-02-01), Toma et al.
patent: 2004/0137728 (2004-07-01), Gallagher et al.
patent: 2005/0221600 (2005-10-01), Daamen et al.
patent: 2006/0025549 (2006-02-01), Kim
patent: 2009/0075491 (2009-03-01), Liu et al.

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