Method for adjusting lithographic mask flatness using...

Photocopying – Projection printing and copying cameras – Detailed holder for original

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S005000

Reexamination Certificate

active

10905453

ABSTRACT:
A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mounted to the mask, the mounting temperature corresponding to the applied stress. The actual temperature of the pellicle frame is adjusted to the determined mounting temperature.

REFERENCES:
patent: 4973283 (1990-11-01), Adler et al.
patent: 5327808 (1994-07-01), Nagata et al.
patent: 5581324 (1996-12-01), Miyai et al.
patent: 6440619 (2002-08-01), Feldman
patent: 6623893 (2003-09-01), Levison et al.
patent: 6653024 (2003-11-01), Shiraishi et al.
patent: 6731378 (2004-05-01), Hibbs et al.
patent: 2003/0035222 (2003-02-01), Okada et al.
patent: 2003/0095245 (2003-05-01), Mishiro et al.
patent: 2003/0123042 (2003-07-01), Laganza et al.
patent: 2003/0197841 (2003-10-01), Araki et al.
patent: 2004/0125354 (2004-07-01), Hibbs
patent: 2005/0048376 (2005-03-01), Eschbach et al.
patent: 4165354 (1992-06-01), None
patent: 9306832 (1997-11-01), None
patent: 2000195784 (2000-07-01), None
E.P cOTTE, R. L. Engelstad, E. G. Lovell, D. Tanzil, F. O. Eschbach, and E. Y. Shu; “Experimental and Numerical Studies of the Effects of Materials and Attachment Conditions on Pellicle-Induced Distortions in Advanced Photomasks;” Proceedings of the SPIE vol. 4754; 2002; pp. 579-588, 2002.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for adjusting lithographic mask flatness using... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for adjusting lithographic mask flatness using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for adjusting lithographic mask flatness using... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3922040

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.