Method for adjusting imaging magnification and charged...

Radiant energy – Inspection of solids or liquids by charged particles – Methods

Reexamination Certificate

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C250S306000, C382S145000

Reexamination Certificate

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07834316

ABSTRACT:
There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern.For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.

REFERENCES:
patent: 5546225 (1996-08-01), Shiraishi
patent: 6868175 (2005-03-01), Yamamoto et al.
patent: 7559047 (2009-07-01), Miyamoto et al.
patent: 05-102259 (1993-04-01), None
patent: 2004-095657 (2004-03-01), None

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