Method for achieving a wear performance which is as linear as po

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451 21, 451550, B24B 4900

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061296090

ABSTRACT:
Material removing machining is for wafer shaped workpieces, in particular semiconductor wafers. There is a method for achieving a wear performance which is as linear as possible for a tool which has an essentially planar working surface for the material removing machining of wafer shaped workpieces. The tool has a wear performance which is as linear as possible. There are also a method and a device for measuring a wear profile on an essentially planar working surface for the material removing machining of wafer shaped workpieces. There is also a carrier which is used for the two-sided material removing machining of wafer shaped workpieces.

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Patent Abstracts of Japan, vol. 096,007, Jul. 31, 1996 & JP08061949A (SpeamCo. Ltd.), Mar. 8, 1996.

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