Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging
Patent
1997-11-26
1998-12-22
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Processing feature prior to imaging
430325, 430326, 430330, 522113, 522126, 522130, 522132, 522133, G03C 516, C08J 328
Patent
active
058517383
ABSTRACT:
Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
REFERENCES:
patent: 4060656 (1977-11-01), Naka et al.
patent: 4299938 (1981-11-01), Green et al.
patent: 4362809 (1982-12-01), Chen et al.
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4413052 (1983-11-01), Green et al.
patent: 4487889 (1984-12-01), Craun
patent: 4576898 (1986-03-01), Hoffman et al.
patent: 4719166 (1988-01-01), Blevins et al.
patent: 4764561 (1988-08-01), Kiss et al.
patent: 4863827 (1989-09-01), Jain et al.
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5693691 (1997-12-01), Flaim et al.
Orsula George W.
Thackeray James W.
Codd Bernard
Corless Peter F.
Frickey Darryl P.
Goldberg Robert L.
Shipley Company L.L.C.
LandOfFree
Method comprising substrates coated with an antihalation layer t does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method comprising substrates coated with an antihalation layer t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method comprising substrates coated with an antihalation layer t will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2045430