Method and system of monitoring E-beam overlay and providing...

Details Method and system of monitoring E-beam overlay and providing... Method and system of monitoring E-beam overlay and providing...

2011-07-12

2011-07-12

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492300, C430S302000, C382S145000

Reexamination Certificate

active

07977655

ABSTRACT:
A method for monitoring overlay of a direct-write system. The method includes providing a substrate having a pattern formed thereon by the direct-write system, generating data associated with the substrate pattern, decomposing the data by applying a transformation matrix, and determining an overlay index based on the decomposed data, the overlay index corresponding to a variation component of the substrate pattern relative to a target pattern.

REFERENCES:
patent: 7292308 (2007-11-01), Galburt et al.
patent: 7871002 (2011-01-01), Smith et al.

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