Method and system for utilizing an isofocal contour to...

Details Method and system for utilizing an isofocal contour to... Method and system for utilizing an isofocal contour to...

2006-10-03

2006-10-03

Lin, Sun James (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07117475

ABSTRACT:
A method and system for performing optical proximity correction (OPC) on an integrated circuit (IC) mask design is disclosed. The system and method of the present invention includes identifying a feature in the IC mask design, generating an isofocal contour for the identified feature, wherein the isofocal contour is a continuum of isofocal points corresponding to points on an edge of the identified feature, and utilizing the isofocal contour to estimate an amount of correction needed to produce a resist image significantly identical to the identified feature.

REFERENCES:
patent: 5723233 (1998-03-01), Garza et al.
patent: 6881523 (2005-04-01), Smith
patent: 6934010 (2005-08-01), Smith
patent: 7016017 (2006-03-01), Hansen
patent: 2002/0186356 (2002-12-01), Smith

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