Method and system for target lifetime

Details Method and system for target lifetime Method and system for target lifetime

2007-10-16

2007-10-16

Neckel, Alexa D. (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S298120

Reexamination Certificate

active

10810534

ABSTRACT:
A method and system for determining a lifetime of a target for a physical vapor deposition tool (302), has, a mapping table (304a) of criteria for a minimum accumulating rate of Δ wafers fabricated by Δ target life for a target in the tool; and a database (304) recording Δ wafers fabricated by Δ target life for a target in the tool; and a computer (306) retrieving the criteria from the mapping table and entering the criteria in the database; and the tool (302) reporting Δ wafers fabricated by Δ target life for a target in the tool (302) for comparison with the criteria.

REFERENCES:
patent: 4166783 (1979-09-01), Turner
patent: 4983269 (1991-01-01), Wegmann
patent: 5478455 (1995-12-01), Actor et al.
patent: 5487823 (1996-01-01), Sawada et al.
patent: 6340415 (2002-01-01), Raaijmakers
patent: 6416635 (2002-07-01), Hurwitt et al.
patent: 6497797 (2002-12-01), Kim
patent: 6610181 (2003-08-01), Besser et al.
patent: 2004/0020769 (2004-02-01), Ivannov et al.
patent: 2005/0236266 (2005-10-01), Poole et al.

Affiliated with

Also associated with

Rating

Method and system for target lifetime does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for target lifetime, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for target lifetime will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3868097