Method and system for selective optical pattern compensation

Details Method and system for selective optical pattern compensation Method and system for selective optical pattern compensation

2005-10-27

2008-09-09

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C430S005000, C430S030000

Reexamination Certificate

active

07424700

ABSTRACT:
A method and system for making a photographic mask. The method includes determining a first contact area, processing information associated with the first contact area, and determining whether a first optical compensation should be applied to the first contact area based on at least information associated with the first contact area. Additionally, the method includes if the first optical compensation should be applied to the first contact area, applying the first optical compensation to the first contact area, processing information associated with first optical compensation, determining a first distance between the first optical compensation and a second optical compensation or a second contact area, processing information associated with the first distance, and adjusting the first optical compensation based on at least information associated with the first distance.

REFERENCES:
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