Method and system for run-to-run control

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Chemical analysis

Reexamination Certificate

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C702S127000, C702S182000, C702S189000, C438S005000, C438S010000, C438S017000, C219S490000, C700S019000, C700S028000, C700S032000

Reexamination Certificate

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07127358

ABSTRACT:
A method and system of controlling a process from run-to-run for semiconductor manufacturing. The method of control utilizes a process model to establish a relationship between process control input data and process control output data. The method of control involves minimizing the difference between target process control output data and process control output data predicted by applying the process model to the new process control input data.

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Patel et al., ‘Adaptive Optimization of Run-to-Run controllers: The EWMA Example’, Feb. 2000, IEEE Publication, vol. 13, No. 1, pp. 97-107.
Del Castillo et al., ‘An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Semiconductor Processes’, May 1998, IEEE Publication, vol. 11, No. 2, pp. 285-295.
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Nital S. Patel, et al., “Adaptive Optimization of Run-to-Run Controllers: The EWMA Example”, IEEE Transactions on Semiconductor Engineering, vol. 13, No. 1, Feb. 2000, pp. 97-107.
P. K. Mozumder, et al., “A Monitor Wafer Based Controller for Semiconductor Processes”, IEEE Transactions on Semiconductor Manufacturing, vol. 7, No. 3, Aug. 1994, pp. 400-411.

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