Method and system for providing inorganic vapor surface treatmen

Details Method and system for providing inorganic vapor surface treatmen Method and system for providing inorganic vapor surface treatmen

1997-12-01

2000-05-23

Bowers, Charles

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

438761, 438759, 438758, 438689, 438725, 430317, 430311, G03C 500

Patent

active

060665785

ABSTRACT:
A system and method for forming a plurality of structures in a low dielectric constant layer is disclosed. The low dielectric constant layer is disposed on a semiconductor. The method and system include exposing the low dielectric constant layer to an agent that improves adhesion of a photoresist, providing a layer of the photoresist on the low dielectric constant layer, patterning the photoresist, and etching the low dielectric constant layer to form the plurality of structures.

REFERENCES:
patent: 4524126 (1985-06-01), Marinace et al.
patent: 5057186 (1991-10-01), Chew et al.
patent: 5407866 (1995-04-01), Sellers
patent: 5759746 (1996-05-01), Azuma et al.

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