Method and system for providing a structure in a...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S005000

Reexamination Certificate

active

07846643

ABSTRACT:
A method and system for providing a microelectric device, such as a magnetoresistive read sensor are described. The method and system include providing a mask layer on the microelectric device. The method and system further include exposing the mask layer to provide a mask. A portion of the mask covers a portion of the microelectric device. The step of exposing the mask layer further includes utilizing a chromeless alt-phase shift mask for providing the portion of the mask.

REFERENCES:
patent: 5487962 (1996-01-01), Rolfson
patent: 5533634 (1996-07-01), Pan et al.
patent: 6376130 (2002-04-01), Stanton
patent: 6664009 (2003-12-01), Liu
patent: 6713237 (2004-03-01), Seigler et al.
patent: 6851103 (2005-02-01), Van Den Broeke et al.
patent: 7014962 (2006-03-01), Lin et al.
patent: 7030966 (2006-04-01), Hansen
patent: 7063921 (2006-06-01), Dettman et al.
patent: 7074529 (2006-07-01), Butt et al.
patent: 7090964 (2006-08-01), Baba-Ali et al.
patent: 7160651 (2007-01-01), Pinkerton et al.
patent: 2004/0101765 (2004-05-01), Sivakumar et al.
patent: 2006/0240332 (2006-10-01), Hung et al.

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